影响化学镀镍沉积速度的因素
毕业论文关键词： 化学镀镍；沉积速度；工艺条件
Factors influencing the deposition rate of electroless plating nickel
Abstract: Chemical plating nickel chemical plating nickel alloy has good wear resistance, corrosion resistance, decorative, magnetic shielding, and uniform coating, good with substrate. Different chemical nickel plating technology of nickel deposit is fast or slow, sedimentary speed of solution can improve the efficiency of production. So, in order to improve the deposition rate of electroless plating solution, increase the stability of the plating solution, study of electroless nickel deposition rate factor has the very vital significance. In this paper, by the reaction of chemical nickel plating, through a series of experimental steps, such as complex changes, temperature, pH, nickel ion concentration, reducing agent such as condition of experiments, study the influence of various process conditions of electroless nickel deposition rate of the best deposition rate. Results show that: 40 g/L nickel sulfate, 35 g/L sodium hypophosphite, 30 g/L ammonium citrate, pH = 9, solution temperature 45 ℃, under the condition of the process, plating solution has excellent stability and deposition rate, coating to the crystalline structure, uniform surface is flat and level.
Keywords: Electroless nickel plating；Deposition rate；Process conditions
目 录
1前言1
1.1概况1
1.2目的与内容1
1.3国内外的历史及发展趋势2
1.4 主要内容3
2工艺技术原理5
2.1化学镀镍的沉积机理5
2.2溶液各组分及其作用原理5
2.2.1还原剂5
2.2.2络合剂6
2.2.3稳定剂7
2.2.4缓冲剂7
2.2.5加速剂8
2.2.6其他成分8
3工艺试验研究方法9
3.1工艺试验方法9
3.2工艺性能测定9
3.2.1沉积速度测试9
3.2.2镀层外观9
3.2.3镀层结合强度测定9
4实验研究11
4.1实验试剂与仪器11
4.1.1实验试剂11
4.1.2 实验仪器、材料11
4.2研究方案11
4.2.1配制除油液11
4.2.2配制除锈液12
4.2.3配制化学镀镍的基础液12
5实验结果与讨论14
5.1研究结果14
5.2溶液组分对沉积速度的影响14
5.2.1 硫酸镍浓度对沉积速度的影响14
5.2.2 次磷酸钠浓度对沉积速度的影响15
5.3操作条件对沉积速度的影响16
5.3.1 温度对沉积速度的影响16
5.3.2 pH对沉积速度的影响17
5.2.3 柠檬酸三铵浓度对沉积速度的影响18
5.4镀层表面形貌19
6结论21
致谢22
参考文献23
1 前言
1.1 化学镀镍的概况
人们一般公认的化学镀技术，是1946年Brenner和Riddell[1]首创的技术，事实上在此之前已经出现过类似当今化学镀技术的金属化的过程。Roux[2]在1915年获得了光亮镍镀层，但因为镀液很快就自发分解了，没有办法得到实际的应用。所以，化学沉积技术被划分成前Brenner-Riddell时期与现代化学沉积时期[3]。经过了至少半个世纪的努力，化学沉积技术在许多工艺、沉积机理及应用方面已经得到了重大进步。
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